| 张岭,胡海峰,顾亮亮,詹其文.基于深紫外激光器的大面积干涉光刻装置研究[J].上海理工大学学报,2022,44(6):540-545. |
| 基于深紫外激光器的大面积干涉光刻装置研究 |
| Large-area interference lithography setup based on deep ultraviolet laser |
| 投稿时间：2022-12-02 |
| DOI：10.13255/j.cnki.jusst.20221202002 |
| 中文关键词: 激光干涉光刻 平顶光 深紫外激光 光栅结构 微纳加工 |
| 英文关键词:laser interference lithography flat-top beam deep UV laser grating structure micro-nano processing |
| 基金项目:上海市科委部分地方院校能力建设项目（19060502500） |
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| 中文摘要: |
| 搭建了基于266 nm波长深紫外光源的干涉光刻装置，使用平顶光整形器将高斯光整形成平顶光束，在硅基底上制备出面积为8.9 mm×25.4 mm、周期为407 nm的一维光栅结构图形和周期为860 nm的二维孔洞结构。使用扫描电子显微镜（SEM）测量了平顶光产生的一维干涉结构的线宽、周期等参数，并与高斯光产生的一维干涉结构参数进行对比。实验结果表明，加入了平顶光整形器的干涉光刻装置产生的周期性光栅结构图形均匀性提升了21.36％。 |
| 英文摘要: |
| The setup based on deep ultraviolet light source with a wavelength of 266 nm was built for interference lithography and a flat-top beam shaper was used to turn Gaussian light into a flat-top beam. Both a one-dimensional grating structure pattern with an area of 8.9 mm×25.4 mm and period of 407 nm, and a two-dimensional hole structure with a period of 860 nm were successfully achieved on silicon substrate. The linewidth, period and other parameters of the one-dimensional interference structure generated by flat-top beam with SEM were measured, and also a comparison was made with the parameters of the one-dimensional interference structure generated by Gaussian light. The experimental results show that the interference lithography setup with flat top beam shaper can produce periodic grating structure patterns with better uniformity, which is increased by 21.36%. |
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