The ion sputter magnetron, (developed since the middle of the 1970's,) is a new method for deposting thin films and is now enjoying great popularity in the field of optical films, decorating coatings and hard coatings. The gun includes electric, magnetic, cooling, insulating and sealing systems. In this paper, the basic design principle of the gun is dealt with, the main parameters of the gun are determined and the test curves of the properties of the gun are presented. Finally, a summary is given of the prospects for the gun and how to improve it in the future.