Abstract:The setup based on deep ultraviolet light source with a wavelength of 266 nm was built for interference lithography and a flat-top beam shaper was used to turn Gaussian light into a flat-top beam. Both a one-dimensional grating structure pattern with an area of 8.9 mm×25.4 mm and period of 407 nm, and a two-dimensional hole structure with a period of 860 nm were successfully achieved on silicon substrate. The linewidth, period and other parameters of the one-dimensional interference structure generated by flat-top beam with SEM were measured, and also a comparison was made with the parameters of the one-dimensional interference structure generated by Gaussian light. The experimental results show that the interference lithography setup with flat top beam shaper can produce periodic grating structure patterns with better uniformity, which is increased by 21.36%.